New
Advanced Thin-Film Monitoring, from ORS
- Reflectometry, Interferometry,
Film Roughness Measurements
- Composition Measurements
using Multi-Wavelength
Laser Interferometry for In Situ Monitoring in MBE, CVD, PVD, ALD, PLD, MOCVD,
MEMS, OLED, Solar, Nanotechnology
- Applications: Film Uniformity,
Lattice Strain, Wafer Bow Monitoring (Patent Pending), Surface Particulates,
Process Residues
- Advanced Optical In
situ Monitoring for VCSEL, Failure Analysis, Fault Isolation, Quality Control,
Real Time Analysis, GaN Growth
- Software Provides Fully
Automated, Quantitative Analysis In Real Time, Synchronized With Substrate
Rotation
- Optical Reference Systems:
for In –Situ Process Information
- Emissivity Corrected
Pyrometer (ECP) Combined With Single- Dual-, Triple Wavelength Reflectometers
- Composition Measurements
UsingMulti-Wavelength Laser Interferometry
- Reflectometry, Emissivity
Corrected Pyrometry (immune to changes in ambient light)
- Wafer-Bow/Strain and
Compositional Analysis
- Data Acquisition Rates
that exceed that of any other In-Situ Tool
- Unrivalled Accuracy
and Reliability of our Instruments
 |
 |
| In-situ
Thin-Film Monitoring |
Wafer-Bow/Strain
and Compositional Analysis |
R-Fit and R-Fit
LIVE Software Solutions:
- Automated Analysis of
the Most Complex Thin Film Deposition Processes
- Deposition/Growth Rate
from 20Å !
- RMS Roughness
- Refractive Index (Real
and Imaginary)
- Individual Layer Thickness
- Statistical Process
Control, Closed Loop Feed-Back
NanoTech
Scientific, Inc.
2
Robertson Road
Worcester MA 01602
www.nanotechscientific.com
support@nanotechscientific.com
phone:
(508) 215-6793
fax: (508) 791-4674
