
SpinTron 3
The SpinTron3 is a circular magnetron sputtering gun with a 3-inch diameter. It can accommodate a wide range of sputtering targets, metallic or insulating, magnetic or non-magnetic. The internal magnetic configuration utilizing a circular rare-earth NdFeB permanent magnetenables excellent film uniformity and target utilization. SpinTron3 is easy to install, to operate, and to maintain. The quality construction provides long-term operation. The shock-absorbing packaging design allows secure shipping and storage.
Features: -
Applications: -
The SpinTron magnetron guns can be used to fabricate a wide range of films. Some of the applications are listed below,
Film coating
Semiconductor devices
Spintronic devices
Magnetic recording media
Superconducting films
Quantum computing devices
MEMS
Biosensors
Nanotechnology
Superlattices
Granular films
Shape memory alloys
Combinatorial thin film deposition
Thin film based lasers
Technical Specification
Sputtering Target
Diameter 3.0" (76.2mm)
Thickness to 1/4" for non-magnetic target
to 1/16" for magnetic target
Utilization up to 30%
Magnet NdFeB Rare Earth Magnet
Power
DC (Max.) 1200 W
RF (Max.) 800 W
Sputtering Current (Max.) 3 Amp
Sputtering Voltage 100-1000 V
Sputtering Pressure .5-100 mTorr
Cooling Water
Flow Rate 1 GPM
Water Inlet Temperature <20 C
Water tubing 0.25" O.D.
Mounting
Feedthrough 1" O.D.tube
Electrical Connector Standard HN type (DC and RF)
Dimension and Weight
Anode Shield Diameter 4.75"
Total Length 15''
Weight 12 lbs
NanoTech
Scientific, Inc.
2
Robertson Road
Worcester MA 01602
www.nanotechscientific.com
support@nanotechscientific.com
phone:
(508) 215-6793
fax: (508) 791-4674